![](/img/cover-not-exists.png)
MOS-compatible fabrication and characterization of tunnel junctions in BESOI-material
T. Köster, B. Hadam, F. Goldschmidtböing, K. Hofmann, J. Gondermann, J. Stein, S. Hu, S. Altmeyer, B. Spangenberg, H. KurzVolume:
41-42
Year:
1998
Language:
english
Pages:
4
DOI:
10.1016/s0167-9317(98)00124-5
File:
PDF, 289 KB
english, 1998