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The degradation of TDDB characteristics of Si02/Si3 N4/Si02 stacked films caused by surface roughness of Si3N4 films [DRAMs]
Tanaka, H., Uchida, H., Ajioka, T., Hirashita, N.Volume:
40
Year:
1993
Language:
english
Pages:
6
DOI:
10.1109/16.249470
File:
PDF, 728 KB
english, 1993