Thin silicide development for fully-depleted SOI CMOS...

IEEE Transactions on Electron Devices 1998 Vol. 45; Iss. 5

Thin silicide development for fully-depleted SOI CMOS technology

Liu, H.I., Burns, J.A., Keast, C.L., Wyatt, P.W.
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Volume:
45
Year:
1998
Language:
english
Pages:
6
DOI:
10.1109/16.669543
File:
PDF, 168 KB
english, 1998
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