Plasma ion implantation hydrogenation of poly-Si CMOS...

IEEE Transactions on Electron Devices 1998 Vol. 45; Iss. 6

Plasma ion implantation hydrogenation of poly-Si CMOS thin-film transistors at low energy and high dose rate using an inductively-coupled plasma source

Shu Qin, Yuanzhong Zhou, Nakatsugawa, T., Husein, I.F., Chung Chan, Tsu-Jae King
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Volume:
45
Year:
1998
Language:
english
Pages:
5
DOI:
10.1109/16.678562
File:
PDF, 118 KB
english, 1998
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