Two-dimensional implications of a purely reactive model for...

IEEE Transactions on Electron Devices 1991 Vol. 38; Iss. 9

Two-dimensional implications of a purely reactive model for plasma etching

Gerodolle, A.F., Pelletier, J.
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Volume:
38
Year:
1991
Language:
english
Pages:
8
DOI:
10.1109/16.83725
File:
PDF, 842 KB
english, 1991
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