Effect of arsenic implantation on electrical...

Effect of arsenic implantation on electrical characteristics of LPCVD WSi2/n-Si Schottky contacts

Shenai, K.
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Volume:
38
Year:
1991
Language:
english
Pages:
3
DOI:
10.1109/16.83726
File:
PDF, 338 KB
english, 1991
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