Electrical instability of low-dielectric constant diffusion...

IEEE Transactions on Electron Devices 2001 Vol. 48; Iss. 10

Electrical instability of low-dielectric constant diffusion barrier film (a-SiC:H) for copper interconnect

Bing-Yue Tsui, Kuo-Lung Fang, Shyh-Dar Lee
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Volume:
48
Year:
2001
Language:
english
Pages:
9
DOI:
10.1109/16.954480
File:
PDF, 153 KB
english, 2001
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