A comparative study of dopant activation in boron, BF2, arsenic, and phosphorus implanted silicon
Mokhberi, A., Griffin, P.B., Plummer, J.D., Paton, E., McCoy, S., Elliott, K.Volume:
49
Year:
2002
Language:
english
Pages:
9
DOI:
10.1109/ted.2002.1013274
File:
PDF, 314 KB
english, 2002