Impact of interfacial layer and transition region on gate current performance for high-K gate dielectric stack: its tradeoff with gate capacitance
Yang-Yu Fan, Qi Xiang, An, J., Register, L.F., Banerjee, S.K.Volume:
50
Year:
2003
Language:
english
Pages:
7
DOI:
10.1109/ted.2003.809433
File:
PDF, 497 KB
english, 2003