Electrical Characteristics and Thermal Stability of Metal...

IEEE Transactions on Electron Devices 2008 Vol. 55; Iss. 11

Electrical Characteristics and Thermal Stability of Metal Gate Electrode for Advanced MOS Devices

Chang-Ta Yang, Kuei-Shu Chang-Liao, Hsin-Chun Chang, Chung-Hao Fu, Tien-Ko Wang, Wen-Fa Tsai, Chi-Fong Ai, Wen-Fa Wu
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Volume:
55
Year:
2008
Language:
english
Pages:
8
DOI:
10.1109/ted.2008.2005128
File:
PDF, 469 KB
english, 2008
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