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Deposition of ultra-thin oxide dielectrics for MOSFETs by a combination of low-temperature plasma-assisted oxidation, and intermediate and high-temperature rapid thermal processing
G. Lucovsky, V. Misra, S.V. Hattangady, T. Yasuda, J.J. WortmanVolume:
187
Year:
1995
Language:
english
Pages:
66
DOI:
10.1016/0022-3093(95)00112-3
File:
PDF, 406 KB
english, 1995