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Properties and applications of electron cyclotron plasma deposited SiOxNy films with graded refractive index profiles
Pavel V. Bulkin, Pieter L. Swart, Beatrys M. LacquetVolume:
187
Year:
1995
Language:
english
Pages:
489
DOI:
10.1016/0022-3093(95)00181-6
File:
PDF, 303 KB
english, 1995