Properties and applications of electron cyclotron plasma...

Properties and applications of electron cyclotron plasma deposited SiOxNy films with graded refractive index profiles

Pavel V. Bulkin, Pieter L. Swart, Beatrys M. Lacquet
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Volume:
187
Year:
1995
Language:
english
Pages:
489
DOI:
10.1016/0022-3093(95)00181-6
File:
PDF, 303 KB
english, 1995
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