Passivation of Si-based structures in HCN and KCN solutions

Applied Surface Science 2012 Vol. 258; Iss. 21

Passivation of Si-based structures in HCN and KCN solutions

Emil Pinčík, Hikaru Kobayashi, Jaroslav Rusnák, Masao Takahashi, Milan Mikula, Woo Byoung Kim, Michal Kučera, Robert Brunner, Stanislav Jurečka
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Volume:
258
Year:
2012
Language:
english
Pages:
1
DOI:
10.1016/j.apsusc.2012.02.121
File:
PDF, 1.51 MB
english, 2012
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