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In situ ellipsometry and infrared analysis of PECVD SiO2 films deposited in an O2/TEOS helicon reactor
C. Vallée, A. Goullet, F. Nicolazo, A. Granier, G. TurbanVolume:
216
Year:
1997
Language:
english
DOI:
10.1016/s0022-3093(97)00172-5
File:
PDF, 511 KB
english, 1997