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The Enhanced Role of Shallow-Trench Isolation in Ionizing Radiation Damage of 65 nm RF-CMOS on SOI
Madan, Anuj, Verma, Rohan, Arora, Rajan, Wilcox, Edward P., Cressler, John D., Marshall, Paul W., Schrimpf, Ronald D., Cheng, Peter F., Del Castillo, Linda Y., Liang, Qingqing, Freeman, GregVolume:
56
Language:
english
Journal:
IEEE Transactions on Nuclear Science
DOI:
10.1109/tns.2009.2033998
Date:
December, 2009
File:
PDF, 924 KB
english, 2009