Chemical vapour deposition of the oxides of titanium, zirconium and hafnium for use as high-k materials in microelectronic devices. A carbon-free precursor for the synthesis of hafnium dioxide
Ryan C. Smith, Tiezhong Ma, Noel Hoilien, Lancy Y. Tsung, Malcolm J. Bevan, Luigi Colombo, Jeffrey Roberts, Stephen A. Campbell, Wayne L. GladfelterVolume:
10
Year:
2000
Language:
english
Pages:
10
DOI:
10.1002/1099-0712(200005/10)10:3/53.0.co;2-j
File:
PDF, 340 KB
english, 2000