Nanolithography by electron beam resist-trimming technique

Nanolithography by electron beam resist-trimming technique

Tatsuro Maeda, Kenichi Ishii, Hiroshi Hiroshima
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Volume:
28
Year:
2000
Language:
english
Pages:
7
DOI:
10.1006/spmi.2000.0950
File:
PDF, 1.50 MB
english, 2000
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