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Performance dependence of CMOS on silicon substrate orientation for ultrathin oxynitride and HfO2 gate dielectrics
Min Yang,, Gusev, E.P., Meikei Ieong,, Gluschenkov, O., Boyd, D.C., Chan, K.K., Kozlowski, P.M., D'Emic, C.P., Sicina, R.M., Jamison, P.C., Chou, A.I.Volume:
24
Language:
english
Pages:
3
Journal:
IEEE Electron Device Letters
DOI:
10.1109/LED.2003.812565
Date:
May, 2003
File:
PDF, 266 KB
english, 2003