Superlens imaging lithography for high aspect ratio sub-wavelength pattern employing trilayer resist process
Fang, Liang, Pan, Li, Wang, Changtao, Luo, XiangangVolume:
110
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2013.04.037
Date:
October, 2013
File:
PDF, 2.00 MB
english, 2013