Improvement of the Performance of TiHfO MIM Capacitors by Using a Dual Plasma Treatment of the Lower Electrode
Cheng, C. H., Pan, H. C., Huang, C. C., Chou, C. P., Hsiao, C. N., Hu, J., Hwang, M., Arikado, T., McAlister, S. P., Chin, AlbertVolume:
29
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/LED.2008.2000945
Date:
October, 2008
File:
PDF, 289 KB
english, 2008