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A Novel Charge-Trapping-Type Memory With Gate-All-Around Poly-Si Nanowire and HfAlO Trapping Layer
Lee, Ko-Hui, Lin, Horng-Chih, Huang, Tiao-YuanVolume:
34
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/LED.2013.2237748
Date:
March, 2013
File:
PDF, 656 KB
english, 2013