![](/img/cover-not-exists.png)
The effects of the pressure and the oxygen content of the sputtering gas on the structure and the properties of zinc oxy-nitride thin films deposited by reactive sputtering of zinc
Jiang, Nanke, Georgiev, Daniel G, Jayatissa, Ahalapitiya HVolume:
28
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/28/2/025009
Date:
February, 2013
File:
PDF, 2.23 MB
english, 2013