Growth kinetics in silane gas-source molecular beam epitaxy

Journal of Crystal Growth 1990 Vol. 105; Iss. 1-4

Growth kinetics in silane gas-source molecular beam epitaxy

Maki Suemitsu, Fumihiko Hirose, Yuji Takakuwa, Nobuo Miyamoto
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Volume:
105
Year:
1990
Language:
english
Pages:
6
DOI:
10.1016/0022-0248(90)90362-o
File:
PDF, 566 KB
english, 1990
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