Etching of InP by HCl in an OMVPE reactor
C. Caneau, R. Bhat, M. Koza, J.R. Hayes, R. EsaguiVolume:
107
Year:
1991
Language:
english
Pages:
6
DOI:
10.1016/0022-0248(91)90457-g
File:
PDF, 438 KB
english, 1991