Growth studies of ferroelectric oxide layers prepared by organometallic chemical vapor deposition
L.A. Wills, W.A. Feil, B.W. Wessels, L.M. Tonge, T.J. MarksVolume:
107
Year:
1991
Language:
english
Pages:
4
DOI:
10.1016/0022-0248(91)90547-i
File:
PDF, 206 KB
english, 1991