The growth mechanism of 〈1010〉 oriented AlN thin films by...

The growth mechanism of 〈1010〉 oriented AlN thin films by low-frequency plasma-enhanced metalorganic chemical vapour deposition process

G.Y. Meng, N. Azéma, B. Cros, J. Durand, L. Cot
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Volume:
129
Year:
1993
Language:
english
Pages:
11
DOI:
10.1016/0022-0248(93)90496-j
File:
PDF, 1.01 MB
english, 1993
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