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Comparison of chemical beam epitaxy and metalorganic chemical vapour deposition for highly strained multiple quantum well InGaAsP/InP 1.5 μm lasers
D.C. Houghton, M. Davies, T. Sudersena Rao, M. DionVolume:
136
Year:
1994
Language:
english
Pages:
8
DOI:
10.1016/0022-0248(94)90383-2
File:
PDF, 692 KB
english, 1994