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Hydrogen desorption rate and surface hydrogen coverage during isothermal annealing for Si2H6-adsorbed Si(100) surfaces
Tetsuhiro Horie, Yuji Takakuwa, Tetsuji Yamaguchi, Nobuo MiyamotoVolume:
136
Year:
1994
Language:
english
Pages:
5
DOI:
10.1016/0022-0248(94)90437-5
File:
PDF, 417 KB
english, 1994