Temperature dependence of GaAs chemical etching using AsCl3

Temperature dependence of GaAs chemical etching using AsCl3

J.M. Ortion, Y. Cordier, J.Ch. Garcia, C. Grattepain
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Volume:
164
Year:
1996
Language:
english
Pages:
7
DOI:
10.1016/0022-0248(95)01019-x
File:
PDF, 429 KB
english, 1996
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