Reaction kinetics and transport phenomena underlying the low-pressure metalorganic chemical vapor deposition of GaAs
N.K. Ingle, C. Theodoropoulos, T.J. Mountziaris, R.M. Wexler, F.T.J. SmithVolume:
167
Year:
1996
Language:
english
Pages:
14
DOI:
10.1016/0022-0248(96)00277-1
File:
PDF, 974 KB
english, 1996