Sub-10nm resolution after lift-off using HSQ/PMMA double...

Microelectronic Engineering 2013 / 10 Vol. 110

Sub-10nm resolution after lift-off using HSQ/PMMA double layer resist

Rommel, Marcus, Nilsson, Bengt, Jedrasik, Piotr, Bonanni, Valentina, Dmitriev, Alexandre, Weis, Jürgen
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
110
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2013.02.101
Date:
October, 2013
File:
PDF, 736 KB
english, 2013
Conversion to is in progress
Conversion to is failed