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Radiation-induced charge trapping in thin Al/sub 2/O/sub 3/SiO/sub x/N/sub y/Si[100] gate dielectric stacks
Felix, J.A., Shaneyfelt, M.R., Fleetwood, D.M., Meisenheimer, T.L., Schwank, J.R., Schrimpf, R.D., Dodd, P.E., Gusev, E.P., D'Emic, C.Volume:
50
Language:
english
Journal:
IEEE Transactions on Nuclear Science
DOI:
10.1109/TNS.2003.820763
Date:
December, 2003
File:
PDF, 588 KB
english, 2003