Effects of plasma-induced defects on electrical...

Thin Solid Films 2014 / 04 Vol. 557

Effects of plasma-induced defects on electrical characteristics of AlGaN/GaN heterostructure before and after low-temperature annealing

Takimoto, Takuma, Takeshita, Koji, Nakamura, Seiji, Okumura, Tsugunori
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Volume:
557
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2013.10.086
Date:
April, 2014
File:
PDF, 591 KB
english, 2014
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