The Electrical and Interfacial Properties of...

IEEE Electron Device Letters 2009 / 02 Vol. 30; Iss. 2

The Electrical and Interfacial Properties of Metal-High-$\kappa$ Oxide-Semiconductor Field-Effect Transistors With $\hbox{LaAlO}_{3}$ Gate Dielectric

Chang, I.Y.-K., Sheng-Wen You,, Pi-Chun Juan,, Ming-Tsong Wang,, Lee, J.Y.-M.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
30
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/led.2009.2009554
Date:
February, 2009
File:
PDF, 204 KB
english, 2009
Conversion to is in progress
Conversion to is failed