Patterning of Si nanowire array with electron beam lithography for sub-22nm Si nanoelectronics technology
Sun, Min-Chul, Kim, Garam, Lee, Jung Han, Kim, Hyungjin, Kim, Sang Wan, Kim, Hyun Woo, Lee, Jong-Ho, Shin, Hyungcheol, Park, Byung-GookVolume:
110
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2013.03.023
Date:
October, 2013
File:
PDF, 1.75 MB
english, 2013