Anti-charging process for electron beam observation and lithography
Aassime, A., Hamouda, F., Richardt, I., Bayle, F., Pillard, V., Lecoeur, P., Aubert, P., Bouchier, D.Volume:
110
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2013.02.036
Date:
October, 2013
File:
PDF, 1.56 MB
english, 2013