Processing of silicon nanostructures by Ga+ resistless lithography and reactive ion etching
Rommel, M., Rumler, M., Haas, A., Bauer, A.J., Frey, L.Volume:
110
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2013.03.081
Date:
October, 2013
File:
PDF, 1.81 MB
english, 2013