A review of nitrogen trifluoride for dry etching in...

A review of nitrogen trifluoride for dry etching in microelectronics processing : Bogdan Golja, John A. Barkanic and Andrew Hoff. Microelectron. J. 16 (1) 5 (1985)

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Volume:
26
Year:
1986
Language:
english
Pages:
2
DOI:
10.1016/0026-2714(86)90589-5
File:
PDF, 246 KB
english, 1986
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