Formation of titanium silicide by rapid thermal annealing :...

Formation of titanium silicide by rapid thermal annealing : D. Pramanik, M. Deal, A. N. Saxena and Owen K. T. Wu. Semiconductor Int. 94 (May 1985)

How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
26
Year:
1986
Language:
english
DOI:
10.1016/0026-2714(86)90651-7
File:
PDF, 121 KB
english, 1986
Conversion to is in progress
Conversion to is failed