Dynamic analyses in mass spectrometry of SF6 plasma during...

Dynamic analyses in mass spectrometry of SF6 plasma during etching of silicon : Nobuki Mutsukura and Guy Turban. Vacuum 39(6), 579 (1989)

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Volume:
30
Year:
1990
Language:
english
DOI:
10.1016/0026-2714(90)90483-4
File:
PDF, 131 KB
english, 1990
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