Interface degradation and dielectric breakdown of thin oxides due to homogeneous charge injection : M. Kerber and U. Schwalke. 27th a. Proc. IEEE/IRPS Int. Reliab. Phys. Symp., 17 (1989)
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Volume:
30
Year:
1990
Language:
english
DOI:
10.1016/0026-2714(90)90525-r
File:
PDF, 128 KB
Your tags:
english, 1990
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