![](/img/cover-not-exists.png)
New applications of focused ion beam technique to failure analysis and process monitoring of VLSI : K. Nikawa, K. Nasu, M. Murase, T. Kaito, T. Adachi and S. Inoue. 27th a. Proc. IEEE/IRPS Int. Reliab. Phys. Symp., 43 (1989)
Volume:
30
Year:
1990
Language:
english
DOI:
10.1016/0026-2714(90)90539-y
File:
PDF, 104 KB
english, 1990