An alternate and simpler method for finding the field-dependent defect density of SiO2 films using MOS capacitor devices
R.K. Bhan, P.C. MathurVolume:
34
Year:
1994
Language:
english
Pages:
4
DOI:
10.1016/0026-2714(94)90150-3
File:
PDF, 245 KB
english, 1994