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Atomic-layer-deposited SiO2/TiO2/SiO2 sandwiched dielectrics for metal–insulator–metal capacitor application
Zhang, Qiu-Xiang, Zhu, Bao, Zhang, Li-Feng, Ding, Shi-JinVolume:
122
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2014.03.013
Date:
June, 2014
File:
PDF, 909 KB
english, 2014