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Effect of atomic-hydrogen irradiation on reduction of residual carrier concentration in β-FeSi2 films grown on Si substrates by atomic-hydrogen-assisted molecular beam epitaxy
Funase, Y., Suzuno, M., Toko, K., Suemasu, T.Volume:
378
Language:
english
Journal:
Journal of Crystal Growth
DOI:
10.1016/j.jcrysgro.2012.12.061
Date:
September, 2013
File:
PDF, 590 KB
english, 2013