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Modeling the in-situ conductance optimization process in focused electron-beam-induced deposition
Winhold, M., Weirich, P.M., Schwalb, C.H., Huth, M.Volume:
121
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2014.03.026
Date:
June, 2014
File:
PDF, 423 KB
english, 2014