Estimation of pattern resolution using NaCl high-contrast...

Microelectronic Engineering 2014 / 06 Vol. 121

Estimation of pattern resolution using NaCl high-contrast developer by Monte Carlo simulation of electron beam lithography

Zhang, Hui, Huda, Miftakhul, Komori, Takuya, Zhang, Yulong, Yin, You, Hosaka, Sumio
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Volume:
121
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2014.04.039
Date:
June, 2014
File:
PDF, 1.24 MB
english, 2014
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