Study of substrate orientations impact on Ultra Thin Buried Oxide (UTBOX) FDSOI High-K Metal gate technology performances
Ben Akkez, Imed, Fenouillet-Beranger, Claire, Cros, Antoine, Perreau, Pierre, Haendler, Sébatien, Weber, Olivier, Andrieu, François, Pellissier-Tanon, D., Abbate, F., Richard, C., Beneyton, R., GourauVolume:
90
Language:
english
Journal:
Solid-State Electronics
DOI:
10.1016/j.sse.2013.02.039
Date:
December, 2013
File:
PDF, 1.71 MB
english, 2013