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On the effects of implantation of ions in the MeV energy range into silicon
L.K. Wang, C.T. Chuang, G.P. LiVolume:
29
Year:
1986
Language:
english
Pages:
5
DOI:
10.1016/0038-1101(86)90160-7
File:
PDF, 460 KB
english, 1986