Process control of rapid thermal N2O-annealed thin gate...

Solid-State Electronics 1996 Vol. 39; Iss. 4

Process control of rapid thermal N2O-annealed thin gate oxides

Yi-Zen Huang, Wei-Shin Lu, Jenn-Gwo Hwu
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Volume:
39
Year:
1996
Language:
english
Pages:
5
DOI:
10.1016/0038-1101(95)00146-8
File:
PDF, 385 KB
english, 1996
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